The preparation of BFO films by sputtering at a temperature as low as 450?C on glass and commercial Pt/Ti/SiO 2/Si(001) substrates have been studied. The underlayers with different orientations were prepared on the glass substrates including strongly textured Pt(111) and L1 0- FePt(001) induced by rapid thermal annealing process. Isotropic perovskite BFO grains with size of about 200 nm formed on the commercial substrates, showing larger surface roughness. Pt(111) suppresses BiFeO 3 phase. Single phase perovskite BFO with strong (001) texture, reduced surface roughness and fine grain size was formed on the L1 0-FePt(001) buffer layer. Considerable enhancement of ferroelectric properties was achieved as compared to the films grown on commercial substrate. ? 2012 American Institute of Physics.
Relation:
Journal of Applied Physics 111 (7) , art. no. 07D918
