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Please use this identifier to cite or link to this item:
http://140.128.103.80:8080/handle/310901/22001
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Title: | Hot-Carrier Degradation Rate of High-Voltage Lateral Diffused Metal-Oxide-Semiconductor Field-Effect Transistors under Maximum Substrate Current Stress Conditions |
Authors: | Chen, S.-H., Gong, J., Wu, M.-C., Su, A.Y.-K. |
Contributors: | Department of Electrical Engineering, Tunghai University |
Keywords: | Degradation rate;High voltage;Hot carrier;Impact Ionization;LDMOSFET |
Date: | 2004 |
Issue Date: | 2013-05-15T09:09:03Z (UTC)
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Abstract: | In this study, hot-carrier stresses in high-voltage (HV) lateral diffused metal-oxide-semiconductor field-effect transistors (LDMOSFETs) are applied under maximum substrate current (I Sub,max) conditions with different V DS and V GS. The power index of the hot-carrier degradation rates is not always 0.5 upon stressing under different I Sub,max conditions, and the HV LDMOSFETs do not exhibit the hot-carrier degradation behavior observed in low-voltage (LV) metal-oxide-semiconductor field-effect transistors (MOSFETs). In order to explain why the degradation rates under I Sub,max conditions differ with different biases, two-dimensional simulators are used to elucidate the degradation mechanism in HV LDMOSFETs. It is found that under different I Sub,max conditions, the highest impact ionization is located at different positions in the drift region of the device. Due to the different gate-control abilities of these regions, the current densities affected by the hot-carrier-induced interface-trapped charges are different. Thus the hot-carrier degradation rates also differ. Furthermore, due to the different depths of the impact ionization region, the amounts of initial hot-carrier-induced interface-trapped charges differ and thus the power-law pre-coefficient A also differs. |
Relation: | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers Volume 43, Issue 1, January 2004, Pages 54-60 |
Appears in Collections: | [電機工程學系所] 期刊論文
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