Tunghai University Institutional Repository:Item 310901/22171
English  |  正體中文  |  简体中文  |  Items with full text/Total items : 21921/27947 (78%)
Visitors : 4216452      Online Users : 360
RC Version 6.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version


    Please use this identifier to cite or link to this item: http://140.128.103.80:8080/handle/310901/22171


    Title: 1/f2 noise spectrum derived from electromigration-induced resistance change
    Authors: Liou, D.M., Gong, J., Chen, C.C.
    Contributors: Department of Electrical Engineering, Tunghai University
    Date: 1990
    Issue Date: 2013-05-15T09:11:44Z (UTC)
    Abstract: A model based on the electromigration-induced resistance change was used to analyze the noise characteristics of aluminum thin-film resistors, and the 1/f2 noise power spectrum was derived theoretically from the rate equation of the resistance change. Experiments were performed on samples stressed with a current density of 1 ? 106 A/cm2 at 125?C for 50 hours. The measured noise indeed showed 1/f2 noise and the results were analyzed quantitatively with the derived model.
    Relation: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
    Volume 29, Issue 7, July 1990, Pages 1283-1285
    Appears in Collections:[Department of Electrical Engineering ] Periodical Articles

    Files in This Item:

    File SizeFormat
    index.html0KbHTML1231View/Open


    All items in THUIR are protected by copyright, with all rights reserved.


    本網站之東海大學機構典藏數位內容,無償提供學術研究與公眾教育等公益性使用,惟仍請適度,合理使用本網站之內容,以尊重著作權人之權益。商業上之利用,則請先取得著作權人之授權。

    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback